Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Mitigation of CMP-induced BPSG surface damage by an integrated anneal and silicon dioxide deposition

Mitigation of CMP-induced BPSG surface damage by an integrated anneal and silicon dioxide deposition

US Patent 5915175 · Granted Jun 22, 1999

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for using a streaming protocol2017
System and method for using a streaming protocol2015
System and method for using a streaming protocol2014
System and method for using a streaming protocol2012
System and method for using a streaming protocol2010
Networked port-inventory system and method2010
System and method for using a streaming protocol2009
Multi-layer electrode and method of forming the same2008
Self-adjusting motorcycle windshield2007
Adhesion layer for Pt on SiO22007
TEOS assisted oxide CMP process2006
Deep isolation trenches2004