Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for reducing the critical dimension difference of features printed on a substrate

Method and apparatus for reducing the critical dimension difference of features printed on a substrate

US Patent 5905020 · Granted May 18, 1999

Estimated economic value: $162,962,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Fair method for selecting regression cases2025
Method, device and computer program product for managing a storage system2022
Method and apparatus for managing storage system2022
Method, apparatus, and system for caching data2020
Implementing snapshot sets for consistency groups of storage volumes2020
Method, apparatus, and system for data deduplication2020
Managing storage system2020
Soft-switch in storage system2019
Method and apparatus for reliably laser marking articles2014
Methods and systems for dynamically generating tailored laser pulses2013
Method and apparatus for reliably laser marking articles2013
Photonic milling using dynamic beam arrays2012