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Home › Process for device fabrication in which the plasma etch is controlled by monitoring optical emission

Process for device fabrication in which the plasma etch is controlled by monitoring optical emission

US Patent 5877032 · Granted Mar 2, 1999

Estimated economic value: $55,366,000 ⓘ

Assignee

AT&T

Inventors

Keith V. Guinn (14 patents)
Susan Clardy McNevin (1 patents)

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