Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Organic solvent soluble photoresists which are developable in aqueous alkaline solutions

Organic solvent soluble photoresists which are developable in aqueous alkaline solutions

US Patent 5849808 · Granted Dec 15, 1998

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Process for pigmenting wood2003
Pigmented porous material2002
Method for producing thermally cleavable, soluble pigment derivatives2002
Heat stable, pigmented sintered material comprising a boride, carbide, silicide,2001
Polymers for photoresist compositions2000
Polymers for photoresist compositions2000
Wet-chemical, developable, etch-stable photoresist for UV radiation with a wavel2000
Photoresist compositions1999
Photoresist compositions1999
Crosslinked polymers1998
Crosslinked polymers1998
Wet-chemical developable, etch-stable photoresist for UV radiation with a wavele1998