Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sputtering apparatus with a rotating magnet array

Sputtering apparatus with a rotating magnet array

US Patent 5795451 · Granted Aug 18, 1998

Estimated economic value: $3,392,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and system using power modulation for maskless vapor deposition of spatia2002
Magnet array2001
Vacuum sputtering apparatus2000
Deposition of insulating thin film by a plurality of ion beams1999
Thin film magnetic structure having ferromagnetic and antiferromagnetic layers1999
Magnetic device for rotating a substrate1998
High throughput manufacturing of thin film data recording disks1997
Method of forming a thin film magnetic structure having ferromagnetic and antife1997
Method of producing exchange coupled magnetic thin films with post-deposition an1996
High density plasma deposition and etching apparatus1995
Nulling optical bridge for contactless measurement of changes in reflectivity an1991
Apparatus for thermo bonding surfaces1985