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Home › Method of forming a polycrystalline silicon layer, a thin film transistor having the polycrystalline silicon layer, method of manufacturing the same, and a liquid crystal display device having the thin film transistor

Method of forming a polycrystalline silicon layer, a thin film transistor having the polycrystalline silicon layer, method of manufacturing the same, and a liquid crystal display device having the thin film transistor

US Patent 5773844 · Granted Jun 30, 1998

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