Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Masked-gate MOS S/D implantation

Masked-gate MOS S/D implantation

US Patent 5700729 · Granted Dec 23, 1997

Estimated economic value: $1,276,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Polysilicon structures with different resistance values for gate electrodes, res2003
Method of fabricating polysilicon structures with different resistance values fo2000
Method for elimination of alignment field gap1999
Etch method for removing metal-fluoropolymer residues1999
Method for masking conducting layers to abate charge damage during plasma etchin1999
Method for eliminating charge damage during etching of conducting layers1998