Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Cleaning agent and method for cleaning semiconductor wafers

Cleaning agent and method for cleaning semiconductor wafers

US Patent 5695572 · Granted Dec 9, 1997

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Process for the wet chemical treatment of semiconductor wafers2007
Method and device for increasing the fail safety of information desks connected 2005
Centrifuge and method for centrifuging a semiconductor wafer2003
Process for the chemical treatment of semiconductor wafers2002
Process for producing a semiconductor wafer2002
Device and method for cleaning semiconductor wafers2002
Adhesive mixture suitable for mounting and demounting a semiconductor wafer2001
Holding device and method for treating wafer-like objects, and a method of treat1992
Process for the wet-chemical treatment of semiconductor surfaces1991
Process for the hydrophilizing and/or cement-residue-removing surface treatment 1991
Process for preserving the surface of silicon wafers1990
Process and apparatus for etching semiconductor surfaces1990