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Home › Tantalum and niobium reagents useful in chemical vapor deposition processes, and process for depositing coatings using the same

Tantalum and niobium reagents useful in chemical vapor deposition processes, and process for depositing coatings using the same

US Patent 5679815 · Granted Oct 21, 1997

Estimated economic value: $1,377,000 ⓘ

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