Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a vinyl ether

Photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a vinyl ether

US Patent 5648194 · Granted Jul 15, 1997

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Receptors providing targeted costimulation for adoptive cell therapy2025
Receptors providing targeted costimulation for adoptive cell therapy2024
Chimeric molecules providing targeted costimulation for adoptive cell therapy2023
License plate radio electronic identifier2018
Immune responses to fusion proteins2005
Recombinant viruses displaying a nonviral polypeptide on their external surface2001
Acid labile photoactive composition1999
Dyed silica pigments and products made from same1999
Antibody against carcionembryonic antigen (CEA)1999
Dye incorporated pigments and products made from same1999
Acid labile photoactive composition1999
Hardenable photoimageable compositions1999