Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Coupled microwave ECR and radio-frequency plasma source for plasma processing

Coupled microwave ECR and radio-frequency plasma source for plasma processing

US Patent 5292370 · Granted Mar 8, 1994

Estimated economic value: $3,557,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Rotating arc spark plug2003
Microwave processing of pressed boron powders for use as cathodes in vacuum arc 2003
Plasma generating apparatus for large area plasma processing1991
Neutral beamline with improved ion energy recovery1984