Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of localized treatment on a projection, in particular for lithographic etching on a semiconductor substrate

Method of localized treatment on a projection, in particular for lithographic etching on a semiconductor substrate

US Patent 5283209 · Granted Feb 1, 1994

Estimated economic value: $237,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Reflective semiconductor optical amplifier for optical networks2015
Optical device having a quantum-dot structure2011
Method for broadcasting information to terminals within a radiocommunication net2009
Method of fabricating a component with crystalline silicon substrate2003
Method of manufacturing a surface-emitting laser1998
Method of forming a plateau and a cover on the plateau in particular on a semico1998
Integrated opto-electronic component1997
Method of fabricating a segmented monocrystalline chip1997
Method of making a mark on a wafer such as a semiconductor wafer incorporating a1997
Method of forming a metal contact on a projection on a semiconductor substrate1995
Method of forming a metal contact on a projection on a semiconductor substrate1995
Semiconductor laser with a saturable absorber1994