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Home › Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor

Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor

US Patent 5264319 · Granted Nov 23, 1993

Estimated economic value: $68,000 ⓘ

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