Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Proximity correction method for E-beam lithography

Proximity correction method for E-beam lithography

US Patent 5241185 · Granted Aug 31, 1993

Estimated economic value: $6,793,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of migrating electronic devices operating in current mode to a target tec2013
Optimization of vehicular traffic flow through a conflict zone2011
Simultaneous computation of multiple points on one or multiple cut lines2010
Performance in model-based OPC engine utilizing efficient polygon pinning method2010
Automated migration of analog and mixed-signal VLSI design2010
Performance in model-based OPC engine utilizing efficient polygon pinning method2010
Renesting interaction map into design for efficient long range calculations2008
Automated migration of analog and mixed-signal VLSI design2008
Simultaneous computation of multiple points on one or multiple cut lines2008
Incorporation of a phase map into fast model-based optical proximity correction 2008
Performance in model-based OPC engine utilizing efficient polygon pinning method2007
Fast and accurate optical proximity correction engine for incorporating long ran2006