Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for buried localized oxidation of a silicon substrate and corresponding integrated circuit

Process for buried localized oxidation of a silicon substrate and corresponding integrated circuit

US Patent 5229318 · Granted Jul 20, 1993

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photovoltaic module including integrated photovoltaic cells2017
Photovoltaic module including integrated photovoltaic cells2016
Method for preparing a coarse-grain crystallized silicon layer2016
Complete recrystallization of semiconductor wafers2015
Semiconductor structure2013
Method for forming a sintered semiconductor material2012
Sintered semiconductor material2012
Method for the production of semiconductor granules2009
Process for producing an electrically conductive diffusion barrier at the metal/1994
Process for producing an electrically conductive diffusion barrier at the metal/1994