{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Process for decreasing the level of impurities in zirconium chloride, titanium chloride and hafnium chloride", "item": "https://www.patentleaderboard.com/patent/5171549"}]}

Home › Process for decreasing the level of impurities in zirconium chloride, titanium chloride and hafnium chloride

Process for decreasing the level of impurities in zirconium chloride, titanium chloride and hafnium chloride

US Patent 5171549 · Granted Dec 15, 1992

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Inventors

Ronald E. Walsh, Jr. (4 patents)
Unknown
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Duane L. Hug (2 patents)

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