Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Laser apparatus and method for measuring stress in a thin film using multiple wavelengths

Laser apparatus and method for measuring stress in a thin film using multiple wavelengths

US Patent 5134303 · Granted Jul 28, 1992

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Robust reflective surface for light modulators2005
Determining large deformations and stresses of layered and graded structures to 2004
Enhance thermal stability through optical segmentation2003
Laser apparatus and method for measuring stress in a thin film using multiple wa1993
Laser apparatus and method for measuring stress in a thin film using multiple wa1993
Programmable memory matrix employing voltage-variable resistors1991
Double layer voltage-programmable device and method of manufacturing same1989
Method of fabricating electrically-programmable element in a semiconductor integ1989