Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for forming one or more substantially pure layers in substrate material using ion implantation

Process for forming one or more substantially pure layers in substrate material using ion implantation

US Patent 5124174 · Granted Jun 23, 1992

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method to produce highly transparent hydrogenated carbon protective coating for 2018
Method to produce highly transparent hydrogenated carbon protective coating for 2017
Low-temperature protonic conduction for hydrogen-related energy applications emp2013
Preparation of dense nanostructured functional oxide materials with fine crystal2009
Backside imaging through a doped layer2009
Metallic glasses with crystalline dispersions formed by electric currents2006
Backside thinning of image array devices2006
Backside thinning of image array devices2006
Microalloying of transition metal silicides by mechanical activation and field-a2003
Versatile, high-sensitivity faraday cup array for ion implanters2003
Method and apparatus for deposition of diamond-like carbon and silicon-doped dia2003
Formation of nanometer-size wires using infiltration into latent nuclear tracks2002