Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Closed loop method and apparatus for preventing exhausted reactant gas from mixing with ambient air and enhancing repeatability of reaction gas results on wafers

Closed loop method and apparatus for preventing exhausted reactant gas from mixing with ambient air and enhancing repeatability of reaction gas results on wafers

US Patent 5118286 · Granted Jun 2, 1992

Estimated economic value: $26,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of using air and hydrogen in low pressure tube transportation2022
Tube transportation systems using a gaseous mixture of air and hydrogen2022
Method of using air and helium in low-pressure tube transportation systems2022
Method and an article of manufacture for determining optimum operating points fo2022
Tube transportation systems using a gaseous mixture of air and helium2019
Method of using air and helium in low-pressure tube transportation systems2019
Systems and methods for mass flow controller verification2015