Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma CVD apparatus

Plasma CVD apparatus

US Patent 5012158 · Granted Apr 30, 1991

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Current-perpendicular-to-plane giant magnetoresistive element, precursor thereof2022
Underlayer for perpendicularly magnetized film, perpendicularly magnetized film 2020
Underlayer for perpendicularly magnetized film, perpendicularly magnetized film 2019
Magnetoresistive element, magnetic head using magnetoresistive element, and magn2018
Current-perpendicular-to-plane magneto-resistance effect element2017
Current-perpendicular-to-plane magneto-resistance effect element2017
Perpendicularly magnetized ultrathin film exhibiting high perpendicular magnetic2016
Co2Fe-based heusler alloy and spintronics devices using the same2016
Method for producing a metal nanoparticle colloid2015
Ferromagnetic tunnel junction structure, and magneto-resistive element and spint2013
Masking material for dry etching2013
Method for producing alloy fine particle colloid2012