Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of making semiconductor device with different oxide film thicknesses

Method of making semiconductor device with different oxide film thicknesses

US Patent 4971923 · Granted Nov 20, 1990

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device and method of manufacturing the same2025
Semiconductor device and ball bonder2019
Semiconductor device and manufacturing method therefor2016
Semiconductor device2013
Semiconductor device2012
Floating gate non-volatile memory2009
Semiconductor integrated circuit and manufacturing method therefore2002
Semiconductor dicing and assembling method2000
Liquid crystal display1993
Liquid crystal display device1993
Method of making semiconductor devices having an implant damage protection film 1992