Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process of deep ultra-violet imaging lithographic resist compositions

Process of deep ultra-violet imaging lithographic resist compositions

US Patent 4808512 · Granted Feb 28, 1989

Estimated economic value: $5,830,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and composition for removing sodium-containing material from microcircuit2005
Photoresist strippers containing reducing agents to reduce metal corrosion2004
Photoresist strippers containing reducing agents to reduce metal corrosion2001
Cleaning wafer substrates of metal contamination while maintaining wafer smoothn1999
Cleaning wafer substrates of metal contamination while maintaining wafer smoothn1996
PH adjusted nonionic surfactant-containing alkaline cleaner composition for clea1995
Alkaline-containing photoresist stripping compositions producing reduced metal c1994
Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents1990
Photosensitive solubilization inhibition agents, and deep ultra-violet lithograp1988
Deep ultra-violet lithographic resist composition and process of using1986
Herbicidal formulation1986
4-Phenoxy-2-butene derivatives as plant growth regulators1982