Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus for chemical vapor deposition with clean effluent and improved product yield

Apparatus for chemical vapor deposition with clean effluent and improved product yield

US Patent 4793283 · Granted Dec 27, 1988

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Cross-flow diffusion furnace1989
CVD boat loading mechanism having a separable, low profile cantilevered paddle a1986
Modular V-CVD diffusion furnace1986
Method for providing substantially waste-free chemical vapor deposition of thin-1985
Apparatus for providing depletion-free uniform thickness CVD thin-film on semico1984