Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Gallium hydride/trialkylamine adducts, and their use in deposition of III-V compound films

Gallium hydride/trialkylamine adducts, and their use in deposition of III-V compound films

US Patent 4740606 · Granted Apr 26, 1988

Estimated economic value: $4,576,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method to reduce crystal defects particularly in group III-nitride layers and su2008
MOCVD of indium oxide and indium/tin oxide films on substrates1992
Use of phosphine and arsine compounds in chemical vapor deposition and chemical 1992
Method for vapor phase deposition of gallium nitride film1988
Method of producing halide-free metal and hydroxides1988
Hydrocarbon-substituted analogs of phosphine and arsine, particularly for metal 1988
Hybrid organometallic compounds, particularly for metal organic chemical vapor d1988
Bubbler cylinder and dip tube device1985