Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Photosensitive film based on silicon-containing polymer and its use as a masking resin in a lithography process

Photosensitive film based on silicon-containing polymer and its use as a masking resin in a lithography process

US Patent 4689288 · Granted Aug 25, 1987

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Process for preparing copolymers by anionic solvent-free polymerization2011
Device comprising a plurality of analysis sites on a support2005
Method for making a biochip and biochip2004
Antimalaria and antibabesiosis agents and pharmaceutical compositions containing2000
Highly pure alkyl 2-cyanoacrylates2000
Highly pure alkyl 2-cyanoacrylates2000
Cataphoretic electrodeposition of polyetherimide2000
Bis(2-aminopyridine)s, preparation method therefor and use thereof for controlli1998
UV-curable organopolysiloxane compositions and negative photoresists comprised t1990
UV-curable organopolysiloxane compositions and negative photoresists comprised t1990
Silicon-containing polymer and its use as a masking resin in a lithography proce1988
Silicon-containing polymer and its use as a masking resin in a lithography proce1988