Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Deposition of silicon dioxide

Deposition of silicon dioxide

US Patent 4686112 · Granted Aug 11, 1987

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Epitaxial metal silicide layers1987
Process for radiation free electron beam deposition1984
Method for making adherent pinhole free aluminum films on pyroelectric and/or pi1980