Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Glow discharge method of applying a carbon coating onto a substrate

Glow discharge method of applying a carbon coating onto a substrate

US Patent 4663183 · Granted May 5, 1987

Estimated economic value: $2,745,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Plasma deposition of amorphous semiconductors at microwave frequencies2012
High speed thin film deposition via pre-selected intermediate2012
Plasma deposition of amorphous semiconductors at microwave frequencies2012
Thin film deposition via a spatially-coordinated and time-synchronized process2012
Ovonic threshold switch film composition for TSLAGS material2012
Optical ovonic threshold switch2012
Plasma deposition of amorphous semiconductors at microwave frequencies2012
Method of manufacturing a photovoltaic device2011
Plasma deposition of amorphous semiconductors at microwave frequencies2011
Thin film deposition via charged particle-depleted plasma achieved by magnetic c2011
Method and apparatus for chalcogenide device formation2011
Programming a normally single phase chalcogenide material for use as a memory of2011