Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for the reactive vapor deposition of layers of oxides, nitrides, oxynitrides and carbides on a substrate

Method and apparatus for the reactive vapor deposition of layers of oxides, nitrides, oxynitrides and carbides on a substrate

US Patent 4619748 · Granted Oct 28, 1986

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Filter candle2024
Antimicrobial glass coating2018
Hot gas filtration system and process for regenerating said system2017
Method for manufacturing sputter-coated substrates, magnetron source and sputter2010
Sliding anode magnetron sputtering source2010
Wear-resistant coating for metal-removing tools, particularly for rotary metal-c2007
Method of manufacturing an object in a vacuum recipient2005
Method for manufacturing a workpiece using a magnetron sputter source2005
Magnetron atomization source and method of use thereof2004
Method of thin film deposition under reactive conditions with RF or pulsed DC pl2004
Magnetron sputter source2004
Method of producing flat panels2004