Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for selective deposition of tungsten on silicon

Method for selective deposition of tungsten on silicon

US Patent 4595608 · Granted Jun 17, 1986

Estimated economic value: $4,067,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Smart lock2025
Smart lock2025
Smart lock2025
Bonding technique to join two or more silicon wafers1989
Using a rapid thermal process for manufacturing a wafer bonded soi semiconductor1988
Process using tungsten for multilevel metallization1987
Dual pulse method of writing amorphous memory devices1983