Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Photochemical process for substrate surface preparation

Photochemical process for substrate surface preparation

US Patent 4590091 · Granted May 20, 1986

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Expandable/retractable thermocouple2014
Mixed germanium-silicon thermal control blanket2007
Wafer etching techniques2006
Inexpensive wafer level MMIC chip packaging2005
Wafer thinning techniques2004
Method for testing solar cell assemblies by ultraviolet irradiation for suscepti2003
Wafer adhesive for semiconductor dry etch applications2003
Method for testing solar cell assemblies and second surface mirrors by ultraviol2002
Chemically treated photoresist for withstanding ion bombarded processing2000
Chemically treated photoresist for withstanding ion bombarded processing1999
Unwinding of plastic film in the presence of a plasma1999
Tilted primary clamshell lens laser scanner1999