Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process of making and using a positive working photosensitive film resist material

Process of making and using a positive working photosensitive film resist material

US Patent 4576902 · Granted Mar 18, 1986

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

UV-stabilized polyoxymethylene molding materials1994
Azulenesquaric acid dyes, azulene intermediates therefor, and optical recording 1992
Optical recording medium1990
Recording material containing a layer of polymer particles and a superimposed me1990
Naphtholactam dyes and optical recording medium containing these dyes1990
Photosensitive recording material1990
Sheet-like, multilayer, laser-optical recording material1989
Naphtholactam dyes and optical recording medium containing these days1989
Irreversible optical recording media and fabrication thereof1989
Naphtholactamsquaric acid dyes and optical recording materials containing these 1989
Novel tetraphenyldithiolene complexes, asymmetrically substituted benzoins, and 1989
Optical recording medium1988