Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Fabrication of metal lines for semiconductor devices

Fabrication of metal lines for semiconductor devices

US Patent 4551905 · Granted Nov 12, 1985

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for gallium nitride on diamond semiconductor wafer production2020
Field effect transistors with gate electrodes having Ni and Ti metal layers2015
Asymmetrically recessed high-power and high-gain ultra-short gate HEMT device2015
Method and design of an RF thru-via interconnect2015
Asymmetrically recessed high-power and high-gain ultra-short gate HEMT device2013
Structure and method for fabrication of field effect transistor gates with or wi2012
Structure and method for fabrication of field effect transistor gates with or wi2011
Reproducible, high yield method for fabricating ultra-short T-gates on HFETs2011
High performance signal processor1988
Ballistic heterojunction bipolar transistor1988
Fabrication of metal lines for semiconductor devices1987
Fabrication of metal lines for semiconductor devices1987