{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Method and apparatus for controlling plasma generation in vapor deposition", "item": "https://www.patentleaderboard.com/patent/4512867"}]}

Home › Method and apparatus for controlling plasma generation in vapor deposition

Method and apparatus for controlling plasma generation in vapor deposition

US Patent 4512867 · Granted Apr 23, 1985

Assignee

No assignee recorded.

Inventors

Anatoly A. Andreev (7 patents)
Unknown

View full patent text on Google Patents →