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LPCVD Deposition of tantalum silicide
LPCVD Deposition of tantalum silicide
US Patent
4504521
· Granted Mar 12, 1985
Estimated economic value:
$1,544,000
ⓘ
Assignee
Rca
Inventors
Alois E. Widmer
(1 patents)
Roland Fehlmann
(1 patents)
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