Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of making amorphous semiconductor alloys and devices using microwave energy

Method of making amorphous semiconductor alloys and devices using microwave energy

US Patent 4504518 · Granted Mar 12, 1985

Estimated economic value: $966,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor phase change memory using face center cubic crystalline phase chan2014
Processing phase change material to improve programming speed2014
Semiconductor phase change memory using multiple phase change layers2013
Plasma deposition of amorphous semiconductors at microwave frequencies2012
Processing phase change material to improve programming speed2012
High speed thin film deposition via pre-selected intermediate2012
Plasma deposition of amorphous semiconductors at microwave frequencies2012
Non-volatile memory device including phase-change material2012
Semiconductor phast change memory using multiple phase change layers2012
Thin film deposition via a spatially-coordinated and time-synchronized process2012
Ovonic threshold switch film composition for TSLAGS material2012
Optical ovonic threshold switch2012