Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Lithographic plates and photoresists having stabilized photosensitive diazo resin with theophylline derivative

Lithographic plates and photoresists having stabilized photosensitive diazo resin with theophylline derivative

US Patent 4499170 · Granted Feb 12, 1985

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Single-phase developers for lithograpic printing elements1995
Single-phase developers for lithograpic printing elements1995
Developer including an aliphatic cyclic carbonate in the oil phase emulsion1987
Developer including an aliphatic cyclic carbonate in the oil phase emulsion1987
Photosensitive plates with diazonium composition layer and polyurethane photopol1986
Method for enhancing apparent photospeed of diazonium plates by using thiocyanat1986
Method for enhancing apparent photospeed of diazonium plates by using thiocyanat1986
Liquid developers for electrostatic images comprising an aliphatic hydrocarbon, 1980