Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sputtering method and apparatus utilizing improved ion source

Sputtering method and apparatus utilizing improved ion source

US Patent 4434038 · Granted Feb 28, 1984

Estimated economic value: $53,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for arc evaporating large area targets1988
Warning system including means for remotely energizing condition sensing device1988
Method and apparatus for improving the safety and extending the range of ionizat1987
Magnetically enhanced sputtering device having a plurality of magnetic field sou1984
Method and apparatus for evaporation arc stabilization including initial target 1984
High rate magnetron sputtering of high permeability materials1984
High rate magnetron sputtering of high permeability materials1983
Sputtering method and apparatus utilizing improved ion source1982
Magnetically enhanced sputtering device and method1982
Method and apparatus for producing a variable intensity pattern of sputtering ma1981
Magnetically enhanced sputtering device1981
Magnetron sputtering devices1980