Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Hybrid moving stage and rastered electron beam lithography system employing approximate correction circuit

Hybrid moving stage and rastered electron beam lithography system employing approximate correction circuit

US Patent 4424450 · Granted Jan 3, 1984

Estimated economic value: $10,126,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Selectively attachable lighting devices and methods2025
Lighting device power control circuit systems and methods2022
Lighting device mount2021
Attachable weapon light2021
Lighting device2020
Lighting device2017
Rail mountable device2017
Accessory mounting hand guard for firearm2016
Ion sources, systems and methods2016
Lighting device bezel2015
Systems and methods for a gas field ionization source2015
Accessory mounting hand guard for firearm2015