Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Low temperature process for depositing an oxide dielectric layer on a conductive surface and multilayer structures formed thereby

Low temperature process for depositing an oxide dielectric layer on a conductive surface and multilayer structures formed thereby

US Patent 4419385 · Granted Dec 6, 1983

Estimated economic value: $10,072,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Process for depositing a conductive oxide layer1987
Photochemical vapor deposition process for depositing oxide layers1986
Low temperature process for depositing epitaxial layers1986
Barrel reactor and method for photochemical vapor deposition1986
Method for photochemical vapor deposition1986
Process for forming a graded index optical material and structures formed thereb1985
Silicon oxynitride material and photochemical process for forming same1985
Process for forming sulfide layers1985
Low-temperature charge-free process for forming native oxide layers1984
Process for forming sulfide layers by photochemical vapor deposition1984
Low temperature process for depositing oxide layers by photochemical vapor depos1983
Method for reducing incidence of periparturient disorders in cows1982