Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Original pattern plate obtained by use of photo-sensitive resin composition

Original pattern plate obtained by use of photo-sensitive resin composition

US Patent 4247621 · Granted Jan 27, 1981

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Image processing device2019
Image processing apparatus and image processing method2019
Image processing device and image processing method which process an image based2019
Image processing apparatus and image processing method2018
Process for producing alkylene oxide adduct and alkylene oxide adduct2018
DMA controller for controlling and measuring the bus occupation time value for a2007
Resin film and manufacturing method for the same, and resin laminated metal shee2007
Deinterleaving device that releases a plurality of types of interleaving simulta2003
Sewing machine with dust removing device2001
Sewing machine with uncurling device2001
Fast fourier transforming apparatus and method, variable bit reverse circuit, in2001
Process for producing hollow resin molded article2001