Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for selective deposition of silicon nitride and structure including selectively-deposited silicon nitride layer

Method for selective deposition of silicon nitride and structure including selectively-deposited silicon nitride layer

US Patent 12494361 · Granted Dec 9, 2025

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Communication device, communication method, and communication system2025
Communication apparatus, control apparatus, and communication system2025
Insulated power supply apparatus and semiconductor device for power supply contr2025
System and method for transmitting control information2025
Magnetic memory2025
Apparatuses for thin film deposition2024
Porous formed body and production method thereof, α-olefin dimerization catalyst2023
Arithmetic processing device having multicore ring bus structure with turn-back 2023
Apparatuses for thin film deposition2022
Magnetic memory2022
Magnetic memory with circuit to supply shift pulse to move a domain wall in a ma2022
Magnetic memory2022