Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor device including a vertically stacked channel pattern and method for manufacturing the same

Semiconductor device including a vertically stacked channel pattern and method for manufacturing the same

US Patent 12477796 · Granted Nov 18, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Steerable overtube assemblies for robotic surgical systems2025
Semiconductor device and method of fabricating the same2025
Semiconductor device and method of fabricating the same2025
Semiconductor device and method for manufacturing the same2025
Semiconductor device and method for manufacturing the same2025
Source/drain region of a semiconductor device having an oxygen doped barrier lay2025
Semiconductor device including barrier layer between active region and semicondu2025
Integrated circuit device including field-effect transistor with controlled size2025
Integrated circuit device including field-effect transistor with controlled size2025
Barrier drape adapters for robotic surgical systems2025
Semiconductor device including source/drain regions having triangular tip region2025
Integrated circuit device2025