Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Dry etching method, production method for semiconductor element, and cleaning method

Dry etching method, production method for semiconductor element, and cleaning method

US Patent 12406854 · Granted Sep 2, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Plasma etching method and method for manufacturing semiconductor element2025
Method for removing metal compound2025
Method for producing bromine pentafluoride2025
Etching method and method for manufacturing semiconductor element2025
Gas treatment method and gas treatment device2024
Etching method2024
Etching method for silicon nitride and production method for semiconductor eleme2024
Dry etching method, method for manufacturing semiconductor element, and cleaning2024
Method for removing halogen fluoride, quantitative analysis method for gas compo2023
Apparatus and method for storing thin film device and method for measuring biolo2023
Nanopore-forming method, nanopore-forming device and biomolecule measurement dev2022
Current measurement device and current measurement method using nanopore2022