Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor structure having silicide layer disposed on sidewalls of the bitline

Semiconductor structure having silicide layer disposed on sidewalls of the bitline

US Patent 12369315 · Granted Jul 22, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor structure and method for manufacturing semiconductor structure2025
Semiconductor structure and method of making the same2025
Semiconductor structure and method of making the same2025
Semiconductor structure and method for fabricating semiconductor structure2025
Semiconductor structure and method for fabricating semiconductor structure2025
Semiconductor structure and fabrication method thereof2025
Semiconductor structure and fabrication method thereof2025
Semiconductor structure with interconnects and method for preparing same2025
Semiconductor structure with interconnects and method for preparing same2025
Electrostatic protection structure and electrostatic protection circuit2024
Electrostatic protection structure and electrostatic protection circuit2024
Diode-triggered bidirectional silicon controlled rectifier and circuit2024