Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming bit line contact structure using series of pickling processes to remove native oxide on surface of the active areas

Method of forming bit line contact structure using series of pickling processes to remove native oxide on surface of the active areas

US Patent 12336163 · Granted Jun 17, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for manufacturing semiconductor bit line contact region with different do2024
Semiconductor structure and method for forming same2024
Method for accurately obtaining photolithography parameter2024
Methods and compositions comprising ilex2007
Methods and compositions comprising Ilex2007