Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Dielectric on wire structure to increase processing window for overlying via

Dielectric on wire structure to increase processing window for overlying via

US Patent 12315817 · Granted May 27, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device structure and methods of forming the same2025
Magneto-resistive random-access memory (MRAM) devices with self-aligned top elec2025
Dual etch-stop layer structure2025
Dual etch-stop layer structure2025
Dual etch-stop layer structure2025
Dual etch-stop layer structure2025
Dual etch-stop layer structure2025
Dual etch-stop layer structure2025
Semiconductor device structure and methods of forming the same2025
Semiconductor device structure and methods of forming the same2025
Semiconductor device structure and methods of forming the same2025
Interconnection structure and methods of forming the same2025