Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for preparing semiconductor device structure with fluorine-catching layer

Method for preparing semiconductor device structure with fluorine-catching layer

US Patent 12308290 · Granted May 20, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for preparing semiconductor device structure having features of different2025
Method for preparing semiconductor device structure having features of different2025
Semiconductor device structure with fluorine-catching layer2025
Method for preparing recessed gate structure with protection layer2025
Semiconductor device with metal spacers and method for fabricating the same2025
Method for preparing recessed gate structure with protection layer2025
Method for preparing semiconductor device structure having features of different2024
Recessed gate strcutre with protection layer2024
Semiconductor device with reduced critical dimensions2024
Method for fabricating semiconductor device with slanted conductive layers2024
Method for preparing semiconductor device structure with manganese-containing li2023
Method for fabricating semiconductor device with metal spacers2023