Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › FinFET device and methods of forming the same

FinFET device and methods of forming the same

US Patent 12249650 · Granted Mar 11, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device with backside power rail and methods of fabrication thereof2025
Semiconductor device and methods of formation2025
Method of manufacturing a semiconductor device2025
Inter-layer dielectrics and etch stop layers for transistor source/drain regions2025
Interconnect layout for semiconductor device2025
Semiconductor device and methods of forming same2025
FinFET structures and methods of forming the same2025
FinFET structures and methods of forming the same2025
FinFET structures and methods of forming the same2025
Source/drain structure for semiconductor fin field effect transistor (finFET) de2025
Source/drain structure for semiconductor fin field effect transistor (finFET) de2025
Semiconductor device with low-galvanic corrosion structures, and method of makin2025