Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for manufacturing nanostructures from a material layer having a thickness below 1 μm

Method and apparatus for manufacturing nanostructures from a material layer having a thickness below 1 μm

US Patent 12235576 · Granted Feb 25, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Emission of electromagnetic radiation and control of the properties of the emitt2025
Emission of electromagnetic radiation and control of the properties of the emitt2025
Logic fabric based on microsector infrastructure2024
Circuitry for reducing leakage current in configuration memory2018
Integrated circuit voltage regulator with adaptive current bleeder circuit2018
Startup circuit2015
Voltage regulator circuitry with adaptive compensation2013
Unconditional frequency compensation technique on-chip low dropout voltage regul2012
Charge pump with ramp rate control2012
Power regulator circuitry for programmable logic device memory elements2011
Mixed mode power regulator circuitry for memory elements2011
Power regulator circuitry for programmable logic device memory elements2010