Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Coating composition for forming resist underlayer film for EUV lithography process

Coating composition for forming resist underlayer film for EUV lithography process

US Patent 12228858 · Granted Feb 18, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Composition for photoresist underlayer2025
Composition for photoresist underlayer2025
Composition for photoresist underlayer2025
Coating compositions for use with an overcoated photoresist2025
Coating compositions for use with an overcoated photoresist2025
Photodetector and image sensor including the same2025
Semiconductor device with multiple zero differential transconductance and method2025
Super-steep switching device and inverter device using the same2025
Negative differential resistance device2025
Semiconductor memory device using a ferroelectric characteristic of charge stora2024
Coating composition for photoresist underlayer2024
Coating composition for photoresist underlayer2024